Surf Wiki
Save to docs
general/semiconductor-device-fabrication

From Surf Wiki (app.surf) — the open knowledge base

Tetrakis(dimethylamido)titanium

(IV)

3398 | NFPA-H = 3 | NFPA-F = 3 | NFPA-R = 2 Tetrakis(dimethylamino)titanium (TDMAT), also known as Titanium(IV) dimethylamide, is a chemical compound. The compound is generally classified as a metalorganic species, meaning that its properties are strongly influenced by the organic ligands but the compound lacks metal-carbon bonds. It is used in chemical vapor deposition to prepare titanium nitride (TiN) surfaces and in atomic layer deposition as a titanium dioxide precursor. The prefix "tetrakis" refers the presence of four of the same ligand, in this case dimethylamides.

Preparation and properties

Tetrakis(dimethylamino)titanium is a conventional Ti(IV) compound in the sense that it is tetrahedral and diamagnetic. Unlike the many alkoxides, the diorganoamides of titanium are monomeric and thus at least somewhat volatile. It is prepared from titanium tetrachloride (which is also tetrahedral, diamagnetic, and volatile) by treatment with lithium dimethylamide: :TiCl4 + 4 LiNMe2 → Ti(NMe2)4 + 4 LiCl Like many amido complexes, TDMAT is quite sensitive toward water, and its handling requires air-free techniques. The ultimate products of its hydrolysis is titanium dioxide and dimethylamine: :Ti(NMe2)4 + 2 H2O → TiO2 + 4 HNMe2 In a related reaction, the compound undergoes exchange with other amines, evolving dimethylamine.

Use

TMAT has been used in metalorganic chemical vapor deposition (MOCVD).

References

References

  1. GHS: [https://www.sigmaaldrich.com/product/ALDRICH/469858 Sigma Aldrich 469858]
  2. D. C. Bradley and I. M. Thomas, "Part I. Metallo-organic Compounds containing Metal-Nitrogen bonds. Some Dialkylamino-derivatives of Titanium and Zirconium" J. Chem. Soc. 1960, 3857-3861. {{doi. 10.1039/JR9600003857.
  3. (1999-05-01). "Comparison of Tetrakis(dimethylamido)titanium and Tetrakis(diethylamido)titanium as Precursors for Metallorganic Chemical Vapor Deposition of Titanium Nitride". Journal of the Electrochemical Society.
Info: Wikipedia Source

This article was imported from Wikipedia and is available under the Creative Commons Attribution-ShareAlike 4.0 License. Content has been adapted to SurfDoc format. Original contributors can be found on the article history page.

semiconductor-device-fabrication titanium(iv)-compounds metal-amides dimethylamino-compounds
Want to explore this topic further?

Ask Mako anything about Tetrakis(dimethylamido)titanium — get instant answers, deeper analysis, and related topics.

Research with Mako

Free with your Surf account

Content sourced from Wikipedia, available under CC BY-SA 4.0.

This content may have been generated or modified by AI. CloudSurf Software LLC is not responsible for the accuracy, completeness, or reliability of AI-generated content. Always verify important information from primary sources.

Report