Tribromosilane

Tribromosilane is the chemical compound with the formula HBr3Si. At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry.

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Column 1Column 2Column 3
IUPAC name
Tribromosilane
Other names
Silicobromoform; Tribromomonosilane
CAS Number.mw-parser-output .plainlist ol,.mw-parser-output .plainlist ul{line-height:inherit;list-style:none;margin:0;padding:0}.mw-parser-output .plainlist ol li,.mw-parser-output .plainlist ul li{margin-bottom:0}7789-57-3 Y
3D model (JSmol)Interactive image
ChemSpider74222
ECHA InfoCard100.029.250
PubChem CID82244
UNIIH5DT3G5DA3 Y
CompTox Dashboard (EPA)DTXSID50160668
InChI
InChI=1S/Br3HSi/c1-4(2)3/h4H
SMILES
BrSiHBr
Chemical formulaBr3HSi
Molar mass268.805 g·mol−1
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).

Infobox references | | |

Tribromosilane is the chemical compound with the formula HBr3Si. At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry.

The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon, but it has a number of cost and safety advantages over the Siemens Process to make polysilicon.

It may be prepared by heating crystalline silicon with gaseous hydrogen bromide at high temperature. It spontaneously combusts when exposed to air.

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