Plasma processing
title: "Plasma processing" type: doc version: 1 created: 2026-02-28 author: "Wikipedia contributors" status: active scope: public tags: ["plasma-processing"] topic_path: "general/plasma-processing" source: "https://en.wikipedia.org/wiki/Plasma_processing" license: "CC BY-SA 4.0" wikipedia_page_id: 0 wikipedia_revision_id: 0
Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.
Plasma processing techniques include:
- Plasma activation
- Plasma ashing
- Plasma cleaning
- Plasma electrolytic oxidation
- Plasma etching
- Plasma functionalization
- Plasma polymerization
- Corona treatment
- Plasma modification
Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.
References
References
- (1991). "Plasma Processing of Materials: Scientific Opportunities and Technological Challenges". National Academies Press.
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